Controversial issues in negative bias temperature instability

• Autores: J.H. Stathis, Souvik Mahapatra, T. Grasser
• Localización: Microelectronics reliability, ISSN 0026-2714, Nº. 81, 2018, págs. 244-251
• Idioma: inglés
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• Resumen

  • In spite of 50years of history, there is still no consensus on the basic physics of Negative Bias Temperature Instability. Two competing models, Reaction-Diffusion and Defect-Centric, currently vie for dominance. The differences appear fundamental: one model holds that NBTI is a diffusion-limited process and the other holds that it is reaction-limited. Basic issues of disagreement are summarized and the main controversial aspects of each model are reviewed and contrasted.