Fast and Accurate in-Line Monitor of Boron Implantation Energy and Dose by Spectroscopic Ellipsometry

• T.Y. Wen ^[1] ; T.W. Lu ^[1] ; Y.R. Wang ^[1] ; C.F. Lin ^[1] ; J.Y. Wu ^[1] ; S.J. Chang ^[2] ; S.M. Chiu ^[2] ; C.J. Huang ^[2] ; C.Y. Cheng ^[2] ; J. Cheng ^[2] ; G. Raphael ^[2] ; Z. Jiang ^[2] ; Z. Tan ^[2]
  1. [1] United Microelectronics Corp. (UMC)
  2. [2] KLA-Tencor Corporation
• Localización: SiGe and Ge: materials, processing, and devices / D. Harane (dir. congr.), 2006, ISBN 978-1-62332-186-4, págs. 417-422
• Idioma: inglés
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