Characterization of submicrometer GaAs MESFET using drift-diffusion simulator

• Hamid Z. Fardi ^[1]
  1. [1] Department of Electrical Engineering University of Colorado at Denver, USA
• Localización: Compel: International journal for computation and mathematics in electrical and electronic engineering, ISSN 0332-1649, Vol. 12, Nº 4, 1993, págs. 361-375
• Idioma: inglés
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• Resumen

  • An empirical velocity‐field relationship, based on Monte Carlo simulation, is used to modify a drift‐diffusion model for the characterization of short gate GaAs MESFET's. The modified drift‐diffusion model is used to generate both the steady‐state and the small‐signal parameters of submicron GaAs MESFET's. The current, transconductance, and cutoff frequency are compared with two‐dimensional Monte Carlo simulation results on a 0.2 µm gate‐length. The model is also used to predict measured I‐V and s‐parameters of a 0.5 µm gate‐length ion‐implanted GaAs MESFET. The comparison and the analysis made, support the accuracy of the modified drift‐diffusion simulator and makes it computationally efficient for analysis of short‐gate devices.