F. Hecht, A. Marrocco, E. Caquot, M. Filoche
Numerical simulation of the static semiconductor device equations using mixed finite element for the approximation and A.D.I. techniques (Douglas‐Rachford with local time steps) for the solution is presented in this paper. The formulation with electrostatic potential φ and quasi‐Fermi levels φn,φp is used.
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