Nickel tropolonate complexes as precursors for the direct photodeposition of nio thin films

• G.E Buono-Core ^[3] ; M Tejos ^[1] ; R Schrebler ^[3] ; A.H Klahn ^[3] ; R.H Hill ^[2]
  1. [1] Universidad de Valparaíso

     Universidad de Valparaíso

     Valparaíso, Chile

     
  2. [2] Simon Fraser University

     Simon Fraser University

     Canadá

     
  3. [3] Universidad Católica de Valparaíso Instituto de Química

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• Localización: Journal of the Chilean Chemical Society (Boletín de la Sociedad Chilena de Química), ISSN-e 0717-6309, ISSN 0366-1644, Vol. 49, Nº. 3, 2004, págs. 223-226
• Idioma: inglés
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  • In this paper we report the obtention of amorphous and nanostructured thin films of NiO, through the direct photolysis of the Ni(II)diaquabis(t-amyltropolonate) complex. Surface morphology observed by scanning electron microscopy showed uniform films of excellent quality, without islands or other imperfections. Purity and composition of the films was determined by X-ray difraction and Auger spectroscopy showing that the main product of photolysis is NiO. Sputtering with Ar ions reduces the oxide to Ni(0) and decreases significantly the carbon contamination of the films