Topography simulation in photolithography using finite element analysis and a modified string algorithm

• K.I. Arshak ^[1] ; D. McDonagh ^[1] ; B.P. Mathur ^[1] ; A. Arshak ^[1]
  1. [1] University of Limerick

     University of Limerick

     Irlanda

     
• Localización: Compel: International journal for computation and mathematics in electrical and electronic engineering, ISSN 0332-1649, Vol. 13, Nº 4, 1994, págs. 871-878
• Idioma: inglés
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  • In this paper, simulation of topography effects in photolithography is examined using the two‐dimensional PC based simulator called SLITS (Simulation of Lithography on Topographic Substrates). This program uses FEA software (in‐house written) to solve wave propagation in a photoresist layer and a modified String Algorithm for photoresist development. The simulated results illustrates the effect of topography on the latent and relief images.