Japón
I‐V characteristics of GaAs n‐i‐n structures are calculated by considering impact ionization of carriers. Impact ionization at reverse‐biased n‐i junction becomes a cause of steep current rise when an acceptor density in the i‐layer is high. It is shown that an optimum acceptor density exists to keep a good isolation. Photoconduction transients of GaAs n‐i‐n structures are also simulated, and are shown to be strongly affected by existence of n‐i junctions.
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