Membre:: An efficient two-dimensional process code for VLSI

• W.D. Murphy ^[1] ; W.F. Hall ^[1] ; C.D. Maldonado ^[1] ; S.A. Loui ^[1]
  1. [1] Rockwell International Science Center, USA
• Localización: Compel: International journal for computation and mathematics in electrical and electronic engineering, ISSN 0332-1649, Vol. 1, Nº 4, 1982, págs. 219-239
• Idioma: inglés
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• Resumen

  • The control of lateral redistribution of dopants, which is critical in VLSI geometries, can be greatly facilitated by fast and accurate simulation of the key steps in the fabrication process. To provide the basic tools for such simulation, a computer code has been developed that models nonlinear dopant redistribution within a silicon substrate whose surface may be simultaneously undergoing nonuniform oxidation. This code, MEMBRE (for Multidimensional Efficient Moving Boundary Redistribution) solves typical dopant drive‐in problems in seconds on the Cyber 176, IBM 3033, or CRAY‐1, by the use of efficient numerical techniques. Multistep fabrication schedules involving field oxide growth and high‐dose implantation and redistribution can be modeled in a few minutes execution time.