Characterization of nanostructured copper films for electromagnetic shield

• Daniele Desideri ^[1] ; Alvise Maschio ^[1] ; Marco Bolzan ^[2] ; Marco Natali ^[2] ; Monica Spolaore ^[3]
  1. [1] University of Padova
  2. [2] National Research Council
  3. [3] Euratom-ENEA Fusion Association,

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• Localización: Compel: International journal for computation and mathematics in electrical and electronic engineering, ISSN 0332-1649, Vol. 31, Nº 4 (Special Issue: Selected papers from EHE 2011), 2012, págs. 1122-1132
• Idioma: inglés
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  • Purpose – The purpose of this paper is to obtain a multidisciplinary characterization of nanostructured copper films for electromagnetic shields.

    Design/methodology/approach – Structural and electrical analysis have been applied, on copper nanometric films produced by a magnetron sputtering device.

    Findings – Data are provided for copper films realized by magnetron sputtering deposition on glass, in different operating conditions.

    Practical implications – A multidisciplinary comprehension of shielding effectiveness of nanostructured thin films can be important in many applications where there are electromagnetic compatibility problems.

    Originality/value – The paper gives a valuable set of information for the characterization of nanometric copper thin films.