The development of adaptive modified appearance using operating window methods for optimizing electron beamThe development of adaptive modified appearance using operating window methods for optimizing electron beam.

• Autores: M.-D. Jean, B.-T. Lin, J.-H. Chou
• Localización: International journal of advanced manufacturing technology, ISSN 0268-3768, Vol. 35, Nº. 5-6, 2007, págs. 480-492
• Idioma: inglés
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