Chemical vapour deposition of titanium chalcogenides and pnictides and tungsten oxide thin films

• Autores: R. G. Palgrave
• Localización: New journal of chemistry, ISSN 1144-0546, Vol. 30, Nº 4, 2006, págs. 505-514
• Idioma: inglés
• Texto completo no disponible (Saber más ...)
• Resumen

  • This perspective article focuses on the formation of titanium chalcogenides and pnictides and tungsten oxides by chemical vapour deposition. Attention is focused on the role of the precursor and on the different microstructures that can be produced under different conditions.