157 nm Pellicles (Thin Films) for Photolithography: Mechanistic Investigation of the VUV and UV-C Photolysis of Fluorocarbons
Autores:Marius Ivan, Robert C. Wheland, Nicholas J. Turro, David A. Dixon, Andre M. Braun, M. F. Lemon, Paul Zimmerman, Steffen Jockusch, Tatjana Widerschpan, Roger H. French