Plasma sources: science & technology

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  Año 2006, Número 3

  • The nitriding of aluminium by dense plasma focus

    págs. 295-301

    

  • Electromagnetic field nonuniformities in large area, high-frequency capacitive plasma reactors, including electrode asymmetry effects

    págs. 302-313

    

  • The effect of pre-ionization by a shunt resistor on the reproducibility of plasma focus x-ray emission

    págs. 314-321

    

  • A comparative study on the performance of a xenon capillary Z-pinch EUV lithography light source using a pinhole camera

    págs. 322-327